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Pure silicon is an insulator. Silicon doped with phosphorus is a semi-conductor. Silicon doped with gallium is also a semiconductor. What is the difference between the two doped silicon semi-conductor?


Phosphorus has one excess valence electron (compared with Si) after forming the four covalent bonds normally with silicon. This excess electron gives rise to electronic conduction. That is why silicon becomes semi-conductor on doping with phosphorus. It is called n-type semi-conductor.

Gallium has only three valence electrons. It creates an electron deficient bond or a hole when it is doped with silicon. Such holes can move in the crystal giving rise to electrical conductivity. Thus silicon doped with gallium is also semi-conductor due to movement of holes. It is called-p-type semiconductor.

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How would you account for the following:
Frenkel defects are not found in alkali metal halides.

Examine the illustration of a portion of the defective crystal given below and answer the following questions:
(i) What are these types of vacancy defects called?
(ii) How is the density of a crystal affected by these defects?
(iii) Name one ionic compound which can show this type of defect in the crystalline state.
(iv) How is the stoichiometry of the compound effected?



How would you account for the following:
Schottky defects lower the density of related solids.

Schottky defects generate an equal number of cation and anion vacancies while doping produces only cation vacancies and not anion vacancies. Why?

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